* Participants : 

Marc Eisenmann, Daiki Haba, Munetake Otsuka, Kento Takeshita, Shalika Singh, Kazuhiro Yamamoto, Haoyu Wang, Rikuto Watanabe

* NAOJ activities

  * new ITMs (Marc): 
    * Okamoto did crack polishing and Nikon is inspecting it

  * birefringence measurement (Marc): 
    * preparing paper on birefringence measurement with LC
    * seems able to adapt this technique to perform 2D measurement with PCI setup (worked with QWP)
    * TWE measurement : added PBS at the output of Fizeau and measured 3 samples (2 non uniform waveplates and 1 10cm diameter sapphire) with 4 different roll angles

  * PI  simulation (Otsuka) : 
    * fixed some issue in previous base (LG)
    * OSCAR losses larger than theory; Haoyu can check with finesse
    * switched from OSCAR to SIS

* Toyama activities (Yamamoto) :
    * Graeme measured aSi/SiO2 stack loss larger than measured in Glasgow. Discrepancy might be due to different annealing?
    * also sent sample to Glasgow to compare GENS and nodal support

* University of Tokyo (Haoyu) :
    * got positive review for TWE paper

* Tokyo Tech (Haba) : 
    * using array detectors to eliminate ASC fluctuations due to birefringence in Finesse and ITMX map
    * some offset present in cavity length lock under investigation

* next meeting September 11th at 16h JST