* Participants :
Marc Eisenmann, Daiki Haba, Munetake Otsuka, Kento Takeshita, Shalika Singh, Kazuhiro Yamamoto, Haoyu Wang, Rikuto Watanabe
* NAOJ activities
- new ITMs (Marc):
- Okamoto did crack polishing and Nikon is inspecting it
- birefringence measurement (Marc):
- preparing paper on birefringence measurement with LC
- seems able to adapt this technique to perform 2D measurement with PCI setup (worked with QWP)
- TWE measurement : added PBS at the output of Fizeau and measured 3 samples (2 non uniform waveplates and 1 10cm diameter sapphire) with 4 different roll angles
- PI simulation (Otsuka) :
- fixed some issue in previous base (LG)
- OSCAR losses larger than theory; Haoyu can check with finesse
- switched from OSCAR to SIS
* Toyama activities (Yamamoto) :
- Graeme measured aSi/SiO2 stack loss larger than measured in Glasgow. Discrepancy might be due to different annealing?
- also sent sample to Glasgow to compare GENS and nodal support
* University of Tokyo (Haoyu) :
- got positive review for TWE paper
* Tokyo Tech (Haba) :
- using array detectors to eliminate ASC fluctuations due to birefringence in Finesse and ITMX map
- some offset present in cavity length lock under investigation
* next meeting September 11th at 16h JST